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    工业纯钛TA2的电解抛光/腐蚀工艺

    Electrolytic Polishing/Corrosion Process of Industrial Pure Titanium TA2

    • 摘要: 对工业纯钛TA2的电解抛光/腐蚀的电解液配方和工艺参数进行了研究与优化,得到的最佳电解液配方是90 mLHF,20 g(NH42S2O8,200 mL CH3CH2OH,360 mL H2O,与之匹配的工艺参数是抛光电压50 V,电解液流量20 mL/s,抛光时间50 s,电解抛光/腐蚀后得到的试样表面平整,组织清晰,无污染,且制样时间短,较机械抛光/腐蚀有很大的进步,采用该配方,调整相应工艺参数便可电解抛光其他钛合金材料。

       

      Abstract: The electrolyte formula and process parameters for electrolytic polishing/corrosion of industrial pure titanium TA2 were studied and optimized. The optimal electrolyte formula was obtained as 90 mL HF, 20 g (NH4)2S2O8, 200 mL LCH3CH2OH, 360 mL H2O. The matching process parameters were polishing voltage of 50V, electrolyte flow rate of 20 mL/s, polishing time of 50 s. The surface of the sample obtained after electrolytic polishing/corrosion was smooth, the metallographic structure was clear, and there was no pollution. The sample preparation time was short, which was a great improvement compared to mechanical polishing/corrosion. By using this formula and adjusting the corresponding process parameters, other titanium alloy materials could be electrolytically polished.

       

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