Flow Plating Process of Amorphous-nanocrystalline Composite Structured Ni-P Alloy

Amorphous-nanocrystalline composite structured Ni-P alloys were widely used in many fields due to their good combination properties. Flow plating receives more attentions as it can improve the deposition rate. In this woric, the influence of electrode distance, current density of cathode and flow rate of electrolyte on the deposition rate, phosphorus content and morphology of the Ni-P deposits was investigated by changing the different technology conditions. The effect mechanism of different technology factors on the course of electrodeposition was also discussed.